A4 Series

The A4 series boasts an extremely energy-efficient motor with a variable speed drive, enabling the vacuum pumps to flexibly adjust their speed to meet individual process requirements. It also includes an idle mode that ensures the vacuum pump operates at the lowest speed between process steps and when not needed. These features result in significant energy savings.

Thanks to sophisticated monitoring functions that oversee the pump health in real time, various operational parameters of the A4 series such as vibration levels, pressure, and condensate detection can be retrieved with a supplied handheld remote controller with display. This enables preventive maintenance and reduces downtime.

An integrated hot nitrogen injection at the exhaust of the A4 vacuum pumps improves operational safety and efficiency and ensures targeted dilution of flammable gases. Pressure and flow regulators continuously monitor the nitrogen supply and issue warnings in case of deviations. The risk of deposits and condensate formation can be reduced, effectively preventing clogging of the exhaust line, which could otherwise lead to explosions.

Furthermore, A4 multi-stage roots vacuum pumps offer advanced temperature control features. Integrated heaters maintain these vacuum pumps at a defined temperature, preventing condensation and unwanted chemical reactions to ensure consistent process quality. Built-in thermal safety functions cut off power if the vacuum pump body temperature exceeds 100°C, avoiding overheating and potential damage to the vacuum pump.

Within the A4 product family, three different versions are available with different corrosion resistances:

The A4H vacuum pumps are tailored for medium-duty processes in the semiconductor and coating industries such as thin film deposition for solar cells. With basic anti-corrosion protection, they offer improved particle tolerance, prevent damage to sensitive pump components, and ensure robust performance to handle these types of processes.

In harsh semiconductor processes such as conductor and polysilicon etch applications, the A4X version is corrosion-resistant and provides reliable dry pumping solutions. It offers enhanced anti-corrosion protection compared to the A4H pumps through special materials that shield the rotors from corrosion.

The A4XN version is ideal for extremely corrosive applications such as chemical vapor deposition (CVD) or atomic layer deposition (ALD). The XN nickel coating technology developed by Pfeiffer protects all parts of the vacuum pump that come into contact with corrosive gases. This significantly extends their lifetime, even in the harshest applications.