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A 100/200 L

Multi-stage roots vacuum pumps

Multi-stage rotary lobe vacuum pump A 100 L

Our A 100 L and A 200 L multi-stage roots vacuum pumps are cutting-edge solutions for the semiconductor industry and for light duty processes with high throughput.

With their compact dimensions and flexible connection options, these pumps can be easily integrated into existing systems, making them the ideal choice for load-lock and transfer chambers, as well as for all non-corrosive applications.

A 100/200 L

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Multi-stage roots vacuum pumps for light duty processes with high throughput

  • High performance
  • Reliable and energy efficient
  • Compact and stackable
  • Low noise and vibration levels

Benefits of the A 100/200 L

The A 100 L and A 200 L are our compact and stackable multi-stage roots vacuum pumps designed for seamless installation in sub-floor systems of semiconductor fabs. With their exceptional performance and energy efficiency, they quickly and efficiently process large volumes of gas during fast pump-down cycles, resulting in higher productivity and lower operating costs compared to standard vacuum pumps in their class. This makes them an ideal solution for applications with high throughput, especially in semiconductor manufacturing processes.

The A 100 L offers fast pump-down times and optional interfaces for easy control and monitoring. The energy saving version reduces pressure inside the compression chamber, which lowers vibrations, noise levels and power consumption by up to 50 %.

For applications that require a more powerful solution and faster pump-down time the A 200 L offers higher pumping speed while reducing power consumption even further. With identical dimensions and connections, it can easily replace the A 100 L when higher performance is required, without any system modifications. An upgraded EtherCAT communication protocol is available for the A 200 L, enabling communication with state-of-the-art technology tools such as semiconductor manufacturing equipment.