Pfeiffer Presents Complete Fab Solutions at SEMICON Europa 2026

Semiconductor manufacturing is facing growing demand for sustainability, productivity and process reliability. At SEMICON Europa 2026, Pfeiffer will demonstrate how manufacturers can address these challenges with integrated solutions covering every stage of semiconductor production, from cleanroom to exhaust. Visitors can explore technologies designed to maximize yield while reducing environmental impact. Through interactive exhibits and digital experiences, the company will showcase how its comprehensive portfolio drives greater efficiency across the entire manufacturing process.

Complete fab solutions from cleanroom to exhaust

A 3D fab model as well as a virtual fab will bring semiconductor manufacturing to life, illustrating where Pfeiffer technologies are deployed throughout the production process. From contamination management and vacuum generation to gas abatement and services, the fab model showcases the range of the Pfeiffer portfolio. It demonstrates how these solutions work together to optimize production, improve process stability and increase wafer yield.

Innovations for maximum yield

Several additional 3D models at the booth will highlight the different contamination management solutions from Pfeiffer, including the Ambient Particle Analyzer (APA), the Ambient Multi-Port Controller (AMPC) and the SmartClean technology. They help manufacturers measure, control and clean airborne molecular and particle contamination to improve wafer quality while reducing defects and enhancing production performance.

Enabling cleaner semiconductor manufacturing

Visitors will also be able to explore a gas abatement system model in 3D, showcasing technologies designed to manage and reduce process emissions generated during semiconductor manufacturing. Installed directly at the process tool, the gas abatement solutions help manufacturers efficiently reduce the emission of gases applied in advanced semiconductor processes, including those with high global warming potential. Using proven thermal, wet, dry adsorption and filtration technologies, the portfolio addresses demanding applications such as etching, chemical vapor deposition (CVD), atomic layer deposition (ALD) and EUV lithography. By minimizing emissions while maintaining safe and reliable operations, the solutions support the sustainability ambitions of both semiconductor manufacturers and Pfeiffer Vacuum+Fab Solutions while also contributing to operational performance.

Service expertise throughout the fab life cycle

In addition to its technology portfolio, Pfeiffer will present its comprehensive service offering for the entire life cycle of semiconductor equipment and facilities. Visitors to the trade show booth will have the opportunity to engage in discussions with experts to gain a deeper understanding of how Pfeiffer Vacuum+Fab Solutions combines contamination management, vacuum technology, gas abatement systems and service capabilities into a unified approach for semiconductor manufacturing excellence.