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A digital semiconductor fab experience will illustrate where Pfeiffer products are deployed throughout the production process. Source: Pfeiffer Vacuum+Fab Solutions

Pfeiffer to Showcase Total Fab Solutions Portfolio at SEMICON West 2026

Pfeiffer Vacuum+Fab Solutions, a member of the global Busch Group, will showcase its broad portfolio of vacuum and abatement technologies for semiconductor manufacturing at SEMICON West 2026 from October 13 to 15 in the Moscone Center San Francisco, California. The exhibits will highlight the company’s solutions across the entire semiconductor fab, from vacuum chambers and dry vacuum pumps to gas abatement systems.

As semiconductor manufacturing becomes increasingly complex, reliable vacuum technology is critical throughout the entire production process. At SEMICON West, Pfeiffer will demonstrate how its technologies and engineering expertise come together to support semiconductor manufacturers and equipment makers from cleanroom to sub-fab.

Vacuum technology for semiconductor manufacturing

Among the technologies on display will be the ATH 4506 M turbomolecular vacuum pump, designed for harsh semiconductor applications. Featuring high pumping speed, outstanding flow capacity, a strong temperature profile and intelligent functions with integrated self-diagnostics, it delivers enhanced performance and process reliability. It will be showcased alongside the UltiDry multi-stage roots vacuum pump, a robust and energy-efficient solution for demanding semiconductor manufacturing processes.

From vacuum chambers to abatement

A special UHV stainless steel vacuum chamber with valves will be displayed in the center of the booth to highlight chamber engineering and manufacturing capabilities. Standard and customized chambers for high and ultra-high vacuum applications are designed and manufactured to meet specific process and integration requirements.

Beyond the technologies on display, a digital semiconductor fab experience will illustrate where Pfeiffer products are deployed throughout the production process. From contamination management to vacuum generation and services, the fab model showcases the range of the Pfeiffer portfolio. It demonstrates how these solutions work together to optimize production, improve process stability and increase wafer yield. The model also highlights how hazardous process gases and by-products can be safely treated using Pfeiffer’s gas abatement technologies, supporting reliable and efficient fab operations.

Contamination management for maximum yield

Several additional 3D models at the booth will highlight Pfeiffer’s contamination management solutions, including the APA pod analyzer, the AMPC ambient multi-port controlling system) and the new SmartClean FOUP cleaner.

SmartClean is designed to support carrier cleanliness while helping optimize fab space and operational efficiency. Featuring a scalable modular architecture and water consumption of just 50 ml per FOUP, the system combines contamination removal capabilities with customizable cleaning recipes to support cleanliness requirements in semiconductor manufacturing environments.

Visitors to the trade show booth will have the opportunity to engage with experts to gain a deeper understanding of how Pfeiffer Vacuum+Fab Solutions combines contamination management, vacuum technology, gas abatement systems and service capabilities into a unified approach for semiconductor manufacturing excellence.