Pfeiffer Vacuum+Fab Solutions to Showcase Cutting-Edge Technology at SEMICON Taiwan 2026

Pfeiffer will present its complete post-processing solutions portfolio for the semiconductor industry. Advanced vacuum pumps, innovative service, contamination management systems and high-quality valves will be on display. A 3D fab model will give visitors a hands-on overview of the complete Pfeiffer offering designed to equip an entire semiconductor facility, from cleanroom to sub-fab.

Innovations in vacuum and service solutions

Among the exhibits are several innovations and key technologies for semiconductor manufacturing processes. The UltiDry multi-stage roots vacuum pump is designed for harsh processes requiring both robustness and low energy consumption. Its oil-free and multi-stage compression ensures clean, dry vacuum without contamination, which is crucial for the sensitive processes in the semiconductor industry.

Waste gas treatment system

Pfeiffer will also exhibit a high-temperature thermal wet gas abatement system. It combines the wide process coverage of flame abatement with the fuel-free aspects of plasma abatement. The system features low operating costs as well as low secondary emissions and can destroy the molecular process gas NF₃ at class-leading levels with extremely low NOx emissions. It provides a sustainable solution with a minimal carbon footprint for the CVD and metal-etch processes.

Contamination management solutions for improved yield

With decades of experience in this field, Pfeiffer offers innovative and comprehensive contamination management solutions for the semiconductor industry. To detect and remove airborne molecular contamination and particles, the portfolio comprises a variety of measurement tools and solutions including ambient multi-port controlling systems (AMPC) and the pod analyzer systems APA as well as ADPC. These solutions enable customers to evaluate FOUP cleaning efficiency, improve wafer yield, manage wafer Q-Time, identify root causes of wafer defects, and monitor FOUP quality as well as internal contamination in cleanroom environments. In addition, new clean and measurement solutions for FOUPs and frame cassettes are available.

Complete product portfolio displayed on screen

A large, interactive touch display at the booth will showcase the complete Pfeiffer product portfolio, ranging from turbomolecular vacuum pumps, valves and gauges for the cleanroom to gas abatement systems and process vacuum pumps in the basement. Moreover, it also covers contamination management solutions, leak detectors and accessories for the entire fab. Visitors can select the products they are interested in and watch informative videos to learn more.

3D model of entire semiconductor fab

In addition to the different technologies presented, a 3D-printed and digital model of a semiconductor fab will illustrate the global offer of Pfeiffer Vacuum+Fab Solutions for the setup of a manufacturing facility in a tangible way, from the cleanroom to the sub-fab. Customers can explore where each of the various technologies from Pfeiffer are integrated throughout the facility, including the brand’s cutting-edge gas abatement systems.