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A digital semiconductor fab experience will illustrate where Pfeiffer products are deployed throughout the production plant. Source: Pfeiffer Vacuum+Fab Solutions.

Pfeiffer to Showcase Total Fab Solutions Portfolio at SEMICON Japan 2026

Pfeiffer Vacuum+Fab Solutions, a member of the global Busch Group, will showcase its broad portfolio of post-processing solutions for semiconductor manufacturing at SEMICON Japan 2026, taking place from December 9 to 11, 2026, at Tokyo Big Sight. The exhibits at booth E2122 in East Hall 2 will highlight solutions spanning the entire semiconductor fab: turbomolecular vacuum pumps, dry vacuum pumps, leak detectors, contamination management solutions, gas abatement systems, vacuum measurement equipment and a wide range of accessories designed to support a broad variety of semiconductor process applications.

As semiconductor manufacturing becomes increasingly complex, reliable downstream solutions are critical throughout the entire production process. At SEMICON Japan 2026, Pfeiffer will demonstrate how its technologies and engineering expertise come together to support semiconductor manufacturers and equipment makers from the cleanroom to the sub-fab.

Vacuum technology for semiconductor manufacturing

Among the technologies on display will be the ATH 4506 M turbomolecular vacuum pump, designed for harsh semiconductor applications. Featuring high pumping speed, outstanding gas-handling capability, a stable temperature profile and intelligent monitoring functions, it delivers enhanced performance and process reliability.

The UltiDry multi-stage roots vacuum pump will also be exhibited. Combining robust design with high energy efficiency, it is a reliable solution for demanding semiconductor manufacturing processes.

From leak testing to gas abatement

From its ASM leak detector series, Pfeiffer will showcase the ASM 392, which has been specifically developed for semiconductor manufacturing environments. Its oil-free design supports cleanroom operation while delivering outstanding reliability and operational safety.

In addition, a 3D and digital semiconductor fab experience will visually demonstrate where Pfeiffer products are deployed throughout the production process. From contamination management and vacuum generation to service solutions, the fab provides a comprehensive overview of the Pfeiffer portfolio.

The model will demonstrate how these solutions work together to improve productivity, enhance process stability and increase wafer yield. Visitors will also learn how hazardous process gases and by-products can be safely treated using Pfeiffer’s gas abatement technologies, supporting reliable and efficient fab operations.

Contamination management for maximum yield

Several 3D models at the booth will highlight Pfeiffer’s contamination management solutions, including the APA pod analyzer, the AMPC (Ambient Multi-Port Controlling System) and the new SmartClean FOUP cleaner.

SmartClean is designed to support carrier cleanliness while helping optimize fab space utilization and operational efficiency. Featuring a scalable modular architecture and ultra-low water consumption, the system combines advanced contamination removal capabilities with customizable cleaning recipes to meet the stringent cleanliness requirements of semiconductor manufacturing environments.

Visitors to the Pfeiffer booth at SEMICON Japan 2026 will have the opportunity to engage with experts and gain a deeper understanding of how Pfeiffer combines contamination management, vacuum technology, gas abatement systems and service capabilities into a unified approach for semiconductor manufacturing excellence.