Pfeiffer Vacuum+Fab Solutions to Showcase Cutting-Edge Technology at SEMICON China 2026

Pfeiffer will present its comprehensive range of vacuum solutions and technical expertise for the semiconductor industry. Advanced vacuum pumps, innovative service solutions, contamination management systems and high-quality valves will be on display. A 3D fab model will give visitors a hands-on overview of the complete Pfeiffer portfolio designed to equip an entire semiconductor facility – from cleanroom to sub-fab.

Innovations in vacuum and service solutions

Among the exhibits are several innovations and key technologies for semiconductor manufacturing processes.

With a pumping speed of 4,500 l/s for nitrogen, the ATH 4506 M turbomolecular vacuum pump is ideal for semiconductor manufacturing processes. At the booth, visitors can discover this newly launched vacuum pump, which features an integrated controller that eliminates the need for separate external control units. This design simplifies installation and reduces the space required in system setups. An idle mode lowers power consumption, contributing to energy-efficient operation of the pump.

The UltiDry multi-stage roots vacuum pump from Pfeiffer Vacuum+Fab Solutions is designed for demanding processes requiring both robustness and low energy consumption. Its oil-free multi-stage compression ensures clean, dry vacuum without contamination, which is crucial for the sensitive processes in the semiconductor industry.

3D model of entire semiconductor fab

In addition to the different technologies presented, a 3D-printed and digital model of a semiconductor fab will illustrate the setup of a manufacturing facility in a tangible way – from the cleanroom to the sub-fab. Customers can explore where each of the various technologies from Pfeiffer are integrated throughout the facility, including the brand’s cutting-edge gas abatement systems.

Contamination Management Solutions for improved yield

With decades of experience in this field, Pfeiffer offers innovative and comprehensive contamination management solutions for the semiconductor industry. To detect and remove airborne molecular contamination, the portfolio comprises a variety of measurement tools and solutions including ambient multi-port controlling systems (AMPC) and the pod analyzer system APA. These solutions enable customers to evaluate FOUP cleaning efficiency, improve wafer yield, manage wafer Q-Time, identify root causes of wafer defects, and monitor FOUP quality as well as internal contamination in cleanroom environments.

Vacuum valves for precise and reliable system design

Pfeiffer will also present parts of its comprehensive valve portfolio at the trade show. On display will be a pendulum valve that offers smooth actuation and high conductance, especially for applications with limited space and a need for reliable vacuum isolation.