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With a pumping speed of 4,500 l/s for nitrogen, the ATH 4506 M turbomolecular vacuum pump is well suited for semiconductor manufacturing processes. Source: Pfeiffer Vacuum+Fab Solutions

Pfeiffer Vacuum+Fab Solutions to Showcase Cutting-Edge Technology at SEMICON Korea 2026

Pfeiffer Vacuum+Fab Solutions, a member of the global Busch Group, will exhibit at SEMICON Korea 2026 from February 11 to 13 at COEX, Seoul, in Hall C, 3rd floor, booth C516.

Pfeiffer will present its comprehensive range of vacuum solutions and technical expertise for the semiconductor industry: Advanced vacuum pumps, innovative service solutions and premium valves will be on display. A digital 3D fab model will give visitors a hands-on overview of the complete Pfeiffer portfolio designed to equip an entire semiconductor facility – from cleanroom to sub-fab.

Innovations in vacuum and service solutions

Among the exhibits are several innovations and key technologies for semiconductor manufacturing processes.

The on-site machine learning and analytics service for semiconductor fabs ARGOS combines production-grade machine learning with decades of vacuum pump and abatement expertise. It converts operational data into prioritized, risk-based actions to increase uptime, reduce total cost-of-ownership, and stabilize yield. This vendor-independent solution operates entirely on the premises, keeping sensitive fab data under customer control.

The UltiDry multi-stage roots vacuum pump from Pfeiffer Vacuum+Fab Solutions is designed for demanding processes that require both robustness and low energy consumption. Its oil-free multi-stage compression ensures clean, dry vacuum without contamination, which is crucial for the sensitive processes in the semiconductor industry.

With a pumping speed of 4,500 l/s for nitrogen, the ATH 4506 M turbomolecular vacuum pump is well suited for semiconductor manufacturing processes. At the booth, visitors can discover this newly launched pump, which comes with an integrated controller that eliminates the need for separate external control units. This design simplifies installation and reduces the space required in the system setup. Different versions are available to match the vacuum pump temperature to individual processes, minimizing condensation and particle buildup, reducing wear, and preventing unplanned downtime. This leads to greater reliability, consistent product quality, and lower total cost-of-ownership for the user.

Vacuum valves for precise and reliable system design

Pfeiffer will also present parts of its comprehensive valve portfolio at the trade show: On display will be a butterfly valve, which reliably isolates system sections while providing efficient gas flow control for high vacuum applications. In addition, a pendulum valve will be showcased which offers smooth actuation as well as high conductance, especially for applications with limited space and a need for reliable vacuum isolation.

3D model of entire semiconductor fab

In addition to the different technologies presented, a digital 3D model of a semiconductor fab will display the setup of a manufacturing facility in a tangible way, from the cleanroom to the sub-fab. Visitors can explore where each of the various technologies from Pfeiffer are integrated throughout the facility – including the brand’s cutting-edge gas abatement systems.